4.2.2 · D4VLSI Design

Exercises — Dennard scaling and its breakdown

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Every problem uses the same tiny toolbox. Keep it in view:

Figure — Dennard scaling and its breakdown

The figure above is your cheat-sheet as a picture: watch which arrows point down (shrink) and which point up (grow), and notice the amber box — power density — sitting flat at .


Level 1 — Recognition

Can you read the rules off the table and pick the right factor?

Recall Solution

What: . Why: the electric field inside the channel is . We already shrank . If we left alone, would double and cook the oxide. Scaling by the same makes — unchanged. That "same field" is the whole point of constant-field scaling. Answer: scales by .

Recall Solution

. Scale: , , . Delay halves → the chip runs faster. Delay goes down.

Recall Solution

Area per device . Four times smaller footprint → more devices per . (This is the row.)


Level 2 — Application

Plug numbers into the rules and turn the crank.

Recall Solution

, and both scale by , so . Answer — about half, exactly the promise.

Recall Solution

Frequency scales by each node ( means ). Two nodes → . Answer . (Historically this is exactly the free-clock era that ended when Dennard scaling broke.)

Recall Solution

Devices grow ; power per device falls to . Answer: unchanged, . The two effects cancel exactly.


Level 3 — Analysis

The voltage knob is removed — trace the consequences.

Recall Solution

What changes: (thinner oxide), unchanged (both shrink by ), and unchanged because and are frozen. Current rises by . Contrast the ideal case where it fell by — losing the voltage knob flips the direction.

Recall Solution

Power per device : , , so . Area per device still shrinks: . So With : . — the chip runs hotter per for the same shrink. This runaway is the power wall.

Recall Solution

Leakage ratio depends only on the change in :

=e^{+0.10/(n\,kT/q)}.$$ The denominator $n\,kT/q=1.5\times0.026=0.039\ \text{V}$. $$=e^{0.10/0.039}=e^{2.564}\approx 13.0.$$ **Leakage grows ~$13\times$ from a mere $0.1\ \text{V}$ threshold cut.** This exponential blow-up ([[Subthreshold Leakage and Static Power]]) is exactly why $V_{th}$ can't keep scaling.
Figure — Dennard scaling and its breakdown

The figure shows why: leakage is a curve that bends upward steeply as falls. A small step left on the axis is a big jump up.


Level 4 — Synthesis

Combine dynamic + static, or compare two whole strategies.

Recall Solution

Dynamic per device: per device — unchanged per device — but more devices, so dynamic area-power . Static: given to grow : Total: Answer — more than double, and note leakage went from to of the budget. This is the dynamic-to-static shift that makes advanced nodes leakage-limited.

Recall Solution

New per-core power: . Cores you can power within : cores. Cores you fit on the die: the old chip had some number, and you fit more per area — but the absolute count you can switch on is capped by heat, not area. If the old chip ran cores ( W, right at TDP), the new die fits cores but can only light of them. The other must stay dark — this is dark silicon.


Level 5 — Mastery

Prove a general relation and reconcile two derivation routes.

Recall Solution

Current: , , : Power per device: Area per device: . Power density: Hmm — let's re-express with the problem's target form. Set density exponent to . Constant density needs the exponent : . Check the endpoints: (ideal Dennard, constant — ✓). (frozen voltage, matches L3.2's — ✓). Only full voltage scaling () holds power density flat; any shortfall makes the chip hotter each node, which is precisely the post-2005 reality.

Recall Solution

Route A (): , . ✓ Route B (): , , Why it matters: describes a static bias picture; describes charging/discharging a capacitor each cycle. They rest on different physics yet land on the identical . That agreement is a consistency check — if they disagreed, one of the scaling assumptions would be wrong.


Recall Self-test: state every scaling factor from memory

Ideal Dennard delay factor ::: (chip faster) Ideal Dennard power-per-device factor ::: Ideal Dennard power-density factor ::: (constant) Frozen-voltage power-density factor ::: (rising) General power-density exponent for voltage scaling :::


Return to Dennard scaling and its breakdown · prerequisites: MOSFET Operation and Square-Law Current · Subthreshold Leakage and Static Power · Multicore and Dark Silicon