2.2.6Doping & PN Junctions

Built-in potential of a junction

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WHAT is it?


WHY does a potential appear at all?


HOW to derive it from first principles

We derive it two equivalent ways. Both start from the same law.

Step 1 — At equilibrium, net current = 0

For electrons, current has two parts: Jn=qμnnEdrift+qDndndxdiffusion=0J_n = \underbrace{q\mu_n n E}_{\text{drift}} + \underbrace{qD_n \frac{dn}{dx}}_{\text{diffusion}} = 0

Why this step? Equilibrium (no battery) means no net current anywhere, so the two mechanisms must exactly balance.

Step 2 — Use the Einstein relation

The Einstein relation links diffusion and mobility: Dn=kTqμnD_n = \frac{kT}{q}\mu_n

Why? Both diffusion and drift come from the same random thermal motion of carriers, so they can't be independent — Einstein's relation ties them together.

Substitute and cancel μn\mu_n: qμnnE+qkTqμndndx=0    E=kTq1ndndxq\mu_n n E + q\frac{kT}{q}\mu_n \frac{dn}{dx} = 0 \;\Rightarrow\; E = -\frac{kT}{q}\frac{1}{n}\frac{dn}{dx}

Step 3 — Turn EE into a potential

Since E=dVdxE = -\dfrac{dV}{dx}: dVdx=kTq1ndndx    dV=kTqdnn-\frac{dV}{dx} = -\frac{kT}{q}\frac{1}{n}\frac{dn}{dx} \;\Rightarrow\; dV = \frac{kT}{q}\frac{dn}{n}

Why? We want a voltage (integratable), and EE is the slope of voltage. This cleverly converts a position integral into a much easier integral over nn.

Step 4 — Integrate across the junction

Integrate from the p-side (where n=npn = n_p) to the n-side (where n=nnn = n_n): Vbi=VnVp=kTqnpnndnn=kTqln ⁣(nnnp)V_{bi} = V_n - V_p = \frac{kT}{q}\int_{n_p}^{n_n}\frac{dn}{n} = \frac{kT}{q}\ln\!\left(\frac{n_n}{n_p}\right)

Step 5 — Plug in doping values

For non-degenerate, fully-ionized doping:

  • n-side majority electrons: nnNDn_n \approx N_D
  • p-side minority electrons (mass-action law np=ni2np = n_i^2): np=ni2NAn_p = \dfrac{n_i^2}{N_A}

Vbi=kTqln ⁣(nnnp)=kTqln ⁣(NDNAni2)\boxed{V_{bi} = \frac{kT}{q}\ln\!\left(\frac{n_n}{n_p}\right) = \frac{kT}{q}\ln\!\left(\frac{N_D \cdot N_A}{n_i^2}\right)}

Why this step? We replaced abstract carrier densities with quantities the fab actually controls: the doping levels.

Figure — Built-in potential of a junction

Worked Examples


Common Mistakes (Steel-manned)


Forecast-then-Verify

Recall Forecast before you compute

Q: If both sides are doped at 101610^{16} (Si), forecast VbiV_{bi}: closer to 0.3, 0.7, or 1.1 V? Verify: ln(1032/1020)=ln(1012)=27.6\ln(10^{32}/10^{20})=\ln(10^{12})=27.6; ×0.02585=0.714\times0.02585 = 0.714 V → ~0.7 V. Textbook silicon value ✓.


Flashcards

What physical process is stopped at equilibrium by the built-in field?
The net diffusion of carriers — drift exactly cancels diffusion so net current = 0.
Write the built-in potential formula.
Vbi=kTqln ⁣(NANDni2)V_{bi} = \frac{kT}{q}\ln\!\left(\frac{N_A N_D}{n_i^2}\right)
Which relation links DnD_n and μn\mu_n in the derivation?
The Einstein relation, Dn=(kT/q)μnD_n = (kT/q)\mu_n.
Why can't you extract energy from VbiV_{bi} with a voltmeter?
Contact potentials at the probe junctions cancel it; total loop voltage = 0.
How much does VbiV_{bi} change per 10× increase in doping?
About +60+60 mV (since kT/qln1059.6kT/q \cdot \ln 10 \approx 59.6 mV).
Why is Ge's VbiV_{bi} lower than Si's?
Ge has a much larger nin_i, shrinking the ratio NAND/ni2N_AN_D/n_i^2 and hence the log.
What is kT/qkT/q at 300 K?
About 25.85 mV (the thermal voltage VTV_T).
What happens to VbiV_{bi} as temperature rises?
It decreases (~2-2 mV/°C for Si) because nin_i grows fast, shrinking the log ratio.
On which side do positive donor ions get exposed?
The n-side of the depletion region.

Recall Feynman: explain to a 12-year-old

Imagine two crowded rooms joined by a door. One room is packed with blue balls (electrons), the other with red balls (holes). Open the door and balls spill into the emptier room. But each ball that leaves its home leaves behind a "sticky spot" (a charged ion) that pulls balls back. Very quickly, a "wall of pull" builds up at the doorway strong enough to stop any more balls from crossing. The strength of that wall, measured as a voltage, is the built-in potential. Nobody plugged in a battery — the balls built the wall themselves just by wanting to spread out.


Connections

  • Depletion region widthVbiV_{bi} sets how wide the carrier-free zone is.
  • Mass-action lawnp=ni2np = n_i^2, used to find npn_p in the derivation.
  • Einstein relation — the bridge between drift and diffusion.
  • PN junction under bias — external voltage adds/subtracts from VbiV_{bi}.
  • Diode I-V equation — the same kT/qkT/q thermal voltage governs the exponential.
  • Intrinsic carrier concentration — temperature dependence of nin_i drives Vbi(T)V_{bi}(T).
  • Energy band diagramsqVbiqV_{bi} = the band bending across the junction.

Concept Map

triggers

leaves behind

forms

creates

causes

opposed by

balances at

defines

combined with

integrate over n

final formula

Glue p-type and n-type

Carrier diffusion

Fixed dopant ions

Depletion region

Built-in E field

Drift current

Equilibrium Jn=0

Built-in potential Vbi

Einstein relation Dn=kT/q mu

Vbi = kT/q ln NA ND / ni^2

Hinglish (regional understanding)

Intuition Hinglish mein samjho

Dekho, jab hum p-type aur n-type silicon ko jodte hain, to n-side me electrons bahut zyada hote hain aur p-side me holes. Nature ko concentration gradient pasand nahi — isliye electrons n se p taraf diffuse karte hain. Lekin jaise hi electron apni jagah chhodta hai, wahan ek fixed positive donor ion khula reh jata hai, aur p-side pe negative acceptor ion. Yeh charged ions ek electric field bana dete hain jo aur carriers ko rukne ke liye bolta hai. Is field ki wajah se jo voltage difference banta hai, usko hi hum built-in potential VbiV_{bi} kehte hain — bina kisi battery ke, khud ba khud.

Formula yaad rakho: Vbi=kTqln(NAND/ni2)V_{bi} = \frac{kT}{q}\ln(N_A N_D / n_i^2). Yahan kT/qkT/q ko thermal voltage kehte hain, jo room temperature (300 K) pe lagbhag 25.85 mV hota hai. Derivation ka core idea simple hai: equilibrium pe net current zero hota hai, matlab drift aur diffusion ek dusre ko exactly cancel karte hain. Einstein relation (Dn=(kT/q)μnD_n = (kT/q)\mu_n) use karke integrate karo, to yeh log wala formula nikal aata hai.

Ek important baat — yeh log hai, isliye doping 10 guna badha do to VbiV_{bi} sirf ~60 mV badhta hai. Bahut weak control hai doping ka. Aur silicon me VbiV_{bi} ~0.7 V aata hai, germanium me ~0.3 V, kyunki germanium ka nin_i bada hota hai. Ek common galti: socho mat ki voltmeter laga ke VbiV_{bi} measure kar loge aur free energy mil jayegi — contact potentials cancel kar dete hain, reading zero aati hai. VbiV_{bi} ek internal quantity hai, EMF nahi.

Go deeper — visual, from zero

Test yourself — Doping & PN Junctions

Connections