Controlling quantity hai VSB (nMOS ke liye, source-to-bulk). Wo parameter jo set karta hai ki VT kitni strongly respond karta hai, wo hai body-effect coefficient γ (gamma).
Gate charge QG ko semiconductor ke andar do cheezein balance karni padti hain:
Inversion chargeQinv — actual channel electrons jo hum chahte hain, aur
Depletion chargeQdep — channel ke neeche depleted region mein immobile ionised acceptor ions.
QG=Qinv+Qdep
Transistor turn on karne ke liye hume itna gate voltage chahiye ki (a) depletion region create ho aur
(b) surface invert ho. Toh threshold roughly hota hai
VT=VFB+2ϕF+CoxQdep
jahan VFB flat-band voltage hai, 2ϕF strong inversion ke liye zaruri surface potential hai, aur Qdep/Cox wo gate voltage hai jo depletion charge support karne mein "use up" ho jaata hai.
Yeh step kyun? Poisson's equation dx2d2ψ=−ερ, constant charge density ρ=−qNA ke saath, do baar integrate karne par ek parabola deta hai; edge se surface tak evaluate karne par ψ∝W2 milta hai. W ke liye invert karo aur qNA se multiply karo toh square-root law milta hai — depletion charge sirf ψ ki tarah badhta hai, linearly nahi.
Ab threshold par zaroori band bending. Bina back-bias ke surface ko 2ϕF tak bend karna hoga.
Reverse source-body bias VSB ke saath, wo total potential jo depletion region ko sustain karna hai, wo hai
2ϕF+VSB:
Qdep(VSB)=2qεsiNA(2ϕF+VSB)
VT mein plug karo aur VSB=0 baseline se increase ko alag karo:
2ϕF subtract kyun karte hain? Kyunki VT0 (threshold at VSB=0) already band bending 2ϕF ke liye depletion charge include karta hai. Hum sirf back-bias ki wajah se badhne wala extra charge add karte hain, isliye baseline term subtract karte hain. Warna double-count ho jaata.
Socho channel ek tiny paani ki pipe hai aur gate ek haath hai jo use kholne ke liye press karta hai. Pipe ke neeche soft mud hai (mobile carriers). Agar aap source ko ground se upar khiichte ho
(yahi back-bias hai), toh aap soft mud ko kheench lete ho aur hard, dry, stuck rocks expose ho jaate hain
(wo fixed ions hain). Ab tumhara haath (gate) rocks ko clear karne ke liye sirf pipe kholne se pehle
zyada zyada push karna padta hai. Toh "turn on karne ke liye minimum push" — threshold — badhta hai.
Aur kyunki rocks clear karna har extra scoop ke saath aasaan hota jaata hai, extra push ek square root ki tarah badhta hai,
straight line ki tarah nahi.
MOSFET threshold voltage VT ki source-to-body voltage VSB par dependence; reverse bias depletion wide karta hai, VT badhata hai.
Body-effect threshold equation batao.
VT=VT0+γ(2ϕF+VSB−2ϕF).
Body-effect coefficient γ define karo.
γ=2qεsiNA/Cox, units V.
VT, VSB ke saath kyun badhta hai?
Reverse bias depletion region wide karta hai, zyada fixed acceptor ions expose karta hai, isliye Qdep badhta hai aur zyada gate voltage ki zarurat hoti hai.
Kya VT–VSB relation linear hai?
Nahi — square-root, kyunki Qdep∝2ϕF+VSB Poisson's equation se aata hai.
High channel doping NA, γ kyun badhata hai?
Volume mein zyada ionised acceptors matlab per unit band bending mein zyada depletion charge, isliye VT zyada strongly respond karta hai.
Thick oxide γ kyun badhata hai?
Cox=εox/tox shrink hota hai, isliye depletion charge ki har unit zyada gate voltage cost karti hai.
Stacked (series) transistors mein body effect kyun hota hai?
Upar wale devices ka source ground ke upar lift hota hai, VSB>0 deta hai, unka VT badhata hai aur drive current kam karta hai.
Qdep vs band bending ψ derive karo.
Poisson deta hai ψ=qNAW2/2εsi, isliye W=2εsiψ/qNA aur Qdep=qNAW=2qεsiNAψ.
Formula mein 2ϕF subtract kyun karte hain?
Kyunki VT0 mein already band bending 2ϕF ke liye depletion charge hai; hum sirf back-bias ki wajah se badhne wala extra add karte hain.